R&D

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R&D Overview

This study succeeded in development and domesticization
for semiconductor and display block masks since 2003.
In the future, through state-of-the-art nano-technology research
It will take the semiconductor and display technology off to the top.

Established	Jan 9th, 2003
Chief Research Officer	Shin, Cheol
Number of Researchers	62 (22% of Total Employees)
Research Results (within 3years)	- Technology Development Records : 17 ��(Process / Product Development) - Target Customers : Samsung Electronics, SK-hynix, SDC, PCL etc
R&D Network	- University : Hanyang University, Pohang University of Science and Technology, Kyungpook National University, Pusan National University, Yeungnam University, DIGIST, UNIST etc - Research Institute : ETRI, NPAC, NanoFab, POHANG ACCELERATOR LABORATORY etc
Main Accomplishments	- Designated as a top 100 'Hidden Champion' company (2019) - Designated as a ��Daegu Star Company 21�� - Designated as a ��Advanced Technology Center - Awarded for Korean ��Top 10 New Technology - Designated as a ��World Class 300�� company - Designated as a ��High Tech Company�� by Korean MSIP - Acquired a number of domestic and international patents.

Domestic Patent Applications
241

Domestic Patents Registered
104

International Patent Applications
99

International Patents Registered
107

R&D Field

Blankmasks for Semiconductors

We are conducting research mainly on advanced blankmasks such as binary intensity mask, phase-shifting mask, and OMOG blankmask.

Main Research Focus Area :
- Binary Intensity Blankmask
- KrF, ArF Phase-shifting Blankmask
- OMOG Blankmask
- Blankmask for EUVL
- Blankmask for Nanoimprint Lithography

Blankmasks for Displays

We are conducting research on blankmasks for next generation displays such as 10G large-area blankmasks, TM, and PSM blank masks.

Main Research Focus Area :
- Binary Intensity Blankmask
- Transmittance Modulation Blankmask
- Phase-shfting Blankmask
- Multi Transmittance Modulation Blankmask