Going beyond the limits of semiconductor scaling
with advanced EUV material technology.
Blank Mask · Pellicle · EUV Materials. S&S Tech is an advanced-materials company growing together with the global semiconductor ecosystem through the core material technologies of the miniaturization era.
The materials behind EUV technology leadership
From blank mask to EUV materials and R&D — a core materials portfolio connecting every stage of micro-processing.
Blank Mask
The base material for photomasks. High-flatness, low-defect thin-film stacks set the standard for fine patterns.
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Pellicle
A protective film against particles on the mask surface. High-transmittance, durable membranes safeguard yield and uptime.
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EUV Materials
Next-generation materials for 13.5nm EUV processes. Leading EUV blank mask and pellicle technology.
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R&D Leadership
Materials R&D that anticipates next-generation processes. Building technology leadership for the EUV era.
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Investor Relations at a glance
Recent Earnings
FY2025 · ConsolidatedIR Center