Company

Welcome, and thank you for visiting the S&S Tech website.

S&S Tech was founded in 2001 to become the first company to develop and produce blankmask, a core raw material used in semiconductor and display manufacturing processes.

As semiconductor and display processes have grown finer and more advanced, the importance of blankmask has come to the fore. To lead this field, we have concentrated on developing high-value-added products through bold R&D investment and the filing and registration of patents. As a result, S&S Tech has established itself as a leading global company producing world-class blankmask.

In recent semiconductor micro-processing, extreme ultraviolet (EUV) lithography has emerged as the heart of technological progress. Accordingly, S&S Tech is focusing its R&D capabilities on securing technology leadership in EUV process materials, and strives to present groundbreaking solutions that lead the future of the global semiconductor industry. In particular, through the development of dedicated EUV Blankmask and Pellicle, we aim to overcome the challenges of fine-process technology and help strengthen our customers’ technological competitiveness.

Going forward, S&S Tech will not rest on its achievements. We will do our utmost to contribute to the advancement of national strategic technologies and to become an innovative company that meets the needs of diverse customers and markets around the world.

Moreover, we will grow and develop together with our customers, partners, and local communities, realizing sustainable management that fulfills our environmental, social, and ethical responsibilities.

We ask for your warm interest and encouragement on S&S Tech’s journey toward a greater future through mutual growth and challenge.

Thank you.